首页> 外文OA文献 >Implementation of the CMOS MEMS Condenser Microphone with Corrugated Metal Diaphragm and Silicon Back-Plate
【2h】

Implementation of the CMOS MEMS Condenser Microphone with Corrugated Metal Diaphragm and Silicon Back-Plate

机译:带有波纹金属膜片和硅背板的CMOS MEMS电容式麦克风的实现

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

This study reports a CMOS-MEMS condenser microphone implemented using the standard thin film stacking of 0.35 μm UMC CMOS 3.3/5.0 V logic process, and followed by post-CMOS micromachining steps without introducing any special materials. The corrugated diaphragm for the microphone is designed and implemented using the metal layer to reduce the influence of thin film residual stresses. Moreover, a silicon substrate is employed to increase the stiffness of the back-plate. Measurements show the sensitivity of microphone is −42 ± 3 dBV/Pa at 1 kHz (the reference sound-level is 94 dB) under 6 V pumping voltage, the frequency response is 100 Hz–10 kHz, and the S/N ratio >55 dB. It also has low power consumption of less than 200 μA, and low distortion of less than 1% (referred to 100 dB).
机译:这项研究报告了CMOS-MEMS电容式麦克风,该麦克风使用0.35μmUMC CMOS 3.3 / 5.0 V逻辑工艺的标准薄膜堆叠实现,随后进行了CMOS微加工步骤,而没有引入任何特殊材料。麦克风的波纹膜片是使用金属层设计和实现的,以减少薄膜残余应力的影响。此外,采用硅衬底来增加背板的刚度。测量表明,在6 V抽运电压下,麦克风在1 kHz时的灵敏度为-42±3 dBV / Pa(参考声级为94 dB),频率响应为100 Hz–10 kHz,信噪比> 55分贝。它还具有小于200μA的低功耗和小于1%(称为100 dB)的低失真。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号